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Title: Metalorganic chemical vapor deposition of α-Ga 2 O 3 and α-(Al x Ga 1−x ) 2 O 3 thin films on m-plane sapphire substrates
Award ID(s):
2019753
NSF-PAR ID:
10343506
Author(s) / Creator(s):
; ; ; ; ;
Date Published:
Journal Name:
APL Materials
Volume:
9
Issue:
10
ISSN:
2166-532X
Page Range / eLocation ID:
101109
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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