Photodetectors based on colloidal quantum dots (CQDs) and single layer graphene (SLG) have shown high responsivity due to the synergy of strong light absorption from CQDs and high mobility from SLG. However, it is still challenging to achieve high-density and small-footprint devices on a chip to meet the demand for their integration into electronic devices. Even though there are numerous approaches to pattern the chemically fragile CQD films, usually they require non-conventional approaches such as stamping and surface modification that may be non-compatible with semiconductor processing. In this study, we show that conventional lithography and dry etching can be used to pattern QD active films by employing a graphene monolayer passivation/protective layer that protects the surface ligands of CQDs. This protective layer avoids damage induced by lithography process solvents that deteriorate the carrier mobility of CQDs and therefore the photoresponse. Herein we report patterning of CQDs using conventional UV photolithography, achieving reproducible five-micron length PbS CQDs/SLG photodetectors with a responsivity of 10 8 A W −1 . We have also fabricated thirty-six PbS CQDs/SLG photodetectors on a single chip to establish micron size photodetectors. This process offers an approach to pattern QDs with conventional UV lithography and dry etching semiconductor technology to facilitate their integration into current semiconductor commercial technology.
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Direct Imprinting of Quasi‐3D Nanophotonic Structures into Colloidal Quantum‐Dot Devices
Three‐dimensional (3D) subwavelength nanostructures have emerged and triggered tremendous excitement because of their advantages over the two‐dimensional (2D) counterparts in fields of plasmonics, photonic crystals, and metamaterials. However, the fabrication and integration of 3D nanophotonic structures with colloidal quantum dots (CQDs) faces several technological obstacles, as conventional lithographic and etching techniques may affect the surface chemistry of colloidal nanomaterials. Here, the direct fabrication of functional quasi‐3D nanophotonic structures into CQD films is demonstrated by one‐step imprinting with well‐controlled precision in both vertical and lateral directions. To showcase the potential of this technique, diffraction gratings, bilayer wire‐grid polarizers, and resonant metal mesh long‐pass filters are imprinted on CQD films without degrading the optical and electrical properties of CQD. Furthermore, a dual‐diode CQD detector into an unprecedented mid‐wave infrared two‐channel polarization detector is functionalized by embedding an imprinted bilayer wire‐grid polarizer within the CQDs. The results show that this approach offers a feasible pathway to combine quasi‐3D nanostructures with colloidal materials‐based optoelectronics and access a new level of light manipulation.
more » « less- NSF-PAR ID:
- 10373680
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- Advanced Materials
- Volume:
- 32
- Issue:
- 9
- ISSN:
- 0935-9648
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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