This content will become publicly available on November 9, 2023
Three-dimensional (3D) nanostructures play a crucial role in nanophotonics, lasers, and optical systems. This article reports on the fabrication of 3D nanostructures consisting of opal structures that are spatially aligned to an array of holes defined in the photoresist. The proposed method uses colloidal lithography to pattern a hexagonal array of holes, which are then used to direct the subsequent 3D assembly of colloidal particles. This approach allows the 3D opal structures to be aligned with the 2D array of holes, which can enhance spatial-phase coherence and reduce defects. The polymer patterns can be used as a sacrificial template for atomic layer deposition and create free-standing nanolattices. The final structure consists of a combination of nanolattice, upon which controlled deposition of opal structures is achieved. These structures result in nanostructured materials with high porosity, which is essential to create low-index materials for nanophotonics. A thick layer of titanium oxide with high refractive index is deposited over nanolattices to demonstrate the mechanical stability of underlying structures. These nanolattice structures with precisely controlled height can serve as a low-index layer and can find applications in Bragg reflectors, nanophotonics, and optical multilayers.
- Publication Date:
- NSF-PAR ID:
- Journal Name:
- Journal of Vacuum Science & Technology B
- Page Range or eLocation-ID:
- Article No. 062803
- American Vacuum Society
- Sponsoring Org:
- National Science Foundation
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