An official website of the United States government
This study summarizes the recent progress in thermoplastic drawing of bulk metallic glasses. The integration of drawing with templated embossing enables the fabrication of arrays of high-aspect-ratio nanostructures whereas the earlier drawing methodologies are limited to a single fiber. The two-step drawing can produce metallic glass structures such as, vertically aligned nanowires on substrates, nanoscale tensile specimens, hollow microneedles, helical shafts, and micro-yarns, which are challenging to fabricate with other thermoplastic forming operations. These geometries will open new applications for bulk metallic glasses in the areas of sensors, optical absorption, transdermal drug-delivery, and high-throughput characterization of size-effects. In this article, we review the emergence of template-based thermoplastic drawing in bulk metallic glasses. The review focuses on the development of experimental set-up, the quantitative description of drawing process, and the versatility of drawing methodology.
more »
« less
Area-Specific Positioning of Metallic Glass Nanowires on Si Substrate
Abstract This paper presents a novel technique to fabricate metallic nanowires in selective areas on a Si substrate. Thermoplastic drawing of viscous metallic glass from cavities etched in Si can produce metallic nanowires. The length and diameter of nanowires can be controlled by adjusting the drawing conditions without changing the Si mold. A thin metal shadow mask is stacked above the Si mold during thermoplastic drawing to fabricate the nanowires only in specific locations. The mask restricts the flow of metallic glass to predefined shapes on the mask, resulting in the formation of nanowires in selected areas on Si. An Al foil-based mask made by a benchtop vinyl cutter is used to demonstrate the proof-of-concept. Even a simple Al foil mask enables the positioning of metallic nanowires in selective areas as small as 200 µm on Si. The precision of the vinyl cutter limits the smallest dimensions of the patterned areas, which can be further improved by using laser-fabricated stencil masks. Results show that a single row of metallic glass nanowires can be patterned on Si using selective thermoplastic drawing. Controllable positioning of metallic nanowires on substrates can enable new applications and characterization techniques for nanostructures.
more »
« less
- Award ID(s):
- 1921435
- PAR ID:
- 10429299
- Publisher / Repository:
- Springer Science + Business Media
- Date Published:
- Journal Name:
- Nanomanufacturing and Metrology
- Volume:
- 6
- Issue:
- 1
- ISSN:
- 2520-811X
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
More Like this
-
-
Aldo R. Boccaccini (Ed.)We report doping of thin (~60 nm) amorphous silicon (a-Si) on glass substrate to form n + polycrystalline silicon on glass in selective regions using Monolayer doping (MLD) via Flash Lamp Annealing (FLA). The phosphorus monolayer was formed on the exposed regions of SiO2 patterned a-Si, through functionalization with chemically bound Diethyl vinylphosphonate (DVP) dopant molecules. The samples were capped with SiO2 and annealed using a single xenon flash pulse (5.0 J/cm2, 250 μs) to simultaneously crystallize a-Si, incorporate and activate phosphorus dopants. SIMS results show an average concentration of 8x1019 cm−3 in the 60 nm of thin silicon on glass. Electrical results show a resistivity of ~6.60x10−2 Ω.cm in doped regions. N-channel field effect transistor devices are successfully demonstrated using this MLD-FLA technique.more » « less
-
Bulk metallic glasses (BMGs) have successfully been used to replicate molds that are structured at the nano- and even atomic scale through thermoplastic forming (TPF), an ability that was speculated to be rooted in the glass’ featureless atomic structure. These previous demonstrations of atomically precise imprinting, however, were performed under conditions where mold atomic feature dimensions coincided with the unit cell size of constituents in the BMG. In order to evaluate if accurate atomic-scale replication is possible in general, i.e., independent of the accidental presence of favorable constituent size/feature size relationships, we have used Pt57.5Cu14.7Ni5.3P22.5 to replicate three different crystalline facets of LaAlO3 single crystals, each exposing distinct atomic step heights. We find that in all cases, the terraced surface termination can be copied with remarkable fidelity, corroborating that BMGs when thermoplastic formed are capable of adapting to any externally imposed confinement with sub-angstrom precision without being limited by factors related to the specifics of their internal structure. This unprecedented capability of quasi-limitless replication fidelity reveals that the deformation mechanism in the supercooled liquid state of BMGs is essentially homogeneous and suggests TPF of BMGs to be a versatile toolbox for atomic and precision nanoscale imprinting.more » « less
-
Nanoimprinting has been applied in many micro- and nanoscale engineered devices; applications include displays, organic electronics, photovoltaics, optical films, and optoelectronics; and in some cases, direct imprinting of functional polymeric devices. Applications in the photonics area can significantly relieve the stringent requirement needed for nanoelectronics. We provide examples of structural colors and optical meta-surfaces facilitated by nanoimprinting, as well as plasmonic lithography masks that can produce deep-subwavelength structures using ordinary UV light. Inkjet printing has been widely used in many applications, but still faces challenges in pattern precision and feature variations. Combining Nanoimprint for patterning and inkjet printing for material deposition will take the advantage of what both technologies can offer, and can provide a high precision additive manufacturing process. We will show printed photonic devices, e.g. electro-optic polymer based optical modulators. To extend nanoimprinting to solid materials other than polymeric films will require innovative and non-conventional approaches. One such process is Metal-assisted chemical (Mac) imprint, which combines MacEtch and nanoiprint and enables direct MacEtch of Si substrate using a hybrid imprinting mold having noble metal mask. However, only low aspect ratio structures have been obtained because of the mass-transport limitation in the previous molds. Recently we effectively solved this problem by a using a specially made mold of Pt-coated anodized aluminum oxide (AAO) membrane, where the holes through the entire thickness drastically enhances the mass-transport. As a result, very high aspect ratio Si nanowires were achieved by MacImprint.more » « less
-
We report on the site-selective growth of >90% vertical GaAs nanowires (NWs) on Si (111) using self-assisted molecular beam epitaxy. The influences of growth parameters (pre-growth Ga opening time, V/III flux ratio) and processing conditions (reactive ion etching (RIE) and HF etching time) are investigated for different pitch lengths (200-1000 nm) to achieve vertical NWs. The processing variables determine the removal of the native oxide layer and the contact angle of Ga-droplet inside the patterned hole that are critical to the vertical orientation of the NWs. Pre-growth Ga-opening time is found to be a crucial factor determining the size of the droplet in the patterned hole, while the V/III beam equivalent pressure (BEP) ratio influenced the occupancy of the holes due to the axial growth of NWs being group-V limited.more » « less
