We demonstrate for the first time, to our knowledge, the occurrence of a
Low propagation loss in high confinement waveguides is critical for chip‐based nonlinear photonics applications. Sophisticated fabrication processes which yield sub‐nm roughness are generally needed to reduce scattering points at the waveguide interfaces to achieve ultralow propagation loss. Here, ultralow propagation loss is shown by shaping the mode using a highly multimode structure to reduce its overlap with the waveguide interfaces, thus relaxing the fabrication processing requirements. Microresonators with intrinsic quality factors (
- Award ID(s):
- 1936345
- NSF-PAR ID:
- 10454554
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- Laser & Photonics Reviews
- Volume:
- 15
- Issue:
- 1
- ISSN:
- 1863-8880
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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