An official website of the United States government
Abstract Materials made by directed self‐assembly of colloids can exhibit a rich spectrum of optical phenomena, including photonic bandgaps, coherent scattering, collective plasmonic resonance, and wave guiding. The assembly of colloidal particles with spatial selectivity is critical for studying these phenomena and for practical device fabrication. While there are well‐established techniques for patterning colloidal crystals, these often require multiple steps including the fabrication of a physical template for masking, etching, stamping, or directing dewetting. Here, the direct‐writing of colloidal suspensions is presented as a technique for fabrication of iridescent colloidal crystals in arbitrary 2D patterns. Leveraging the principles of convective assembly, the process can be optimized for high writing speeds (≈600 µm s−1) at mild process temperature (30 °C) while maintaining long‐range (cm‐scale) order in the colloidal crystals. The crystals exhibit structural color by grating diffraction, and analysis of diffraction allows particle size, relative grain size, and grain orientation to be deduced. The effect of write trajectory on particle ordering is discussed and insights for developing 3D printing techniques for colloidal crystals via layer‐wise printing and sintering are provided.
more »
« less
Massively Scalable Self‐Assembly of Nano and Microparticle Monolayers via Aerosol Assisted Deposition
Abstract An extremely rapid process for self‐assembling well‐ordered, nano, and microparticle monolayers via a novel aerosolized method is presented. The novel technique can reach monolayer self‐assembly rates as high as 268 cm2min−1from a single aerosolizing source and methods to reach faster monolayer self‐assembly rates are outlined. A new physical mechanism describing the self‐assembly process is presented and new insights enabling high‐efficiency nanoparticle monolayer self‐assembly are developed. In addition, well‐ordered monolayer arrays from particles of various sizes, surface functionality, and materials are fabricated. This new technique enables a 93× increase in monolayer self‐assembly rates compared to the current state of the art and has the potential to provide an extremely low‐cost option for submicron nanomanufacturing.
more »
« less
- PAR ID:
- 10478409
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- Advanced Materials
- Volume:
- 36
- Issue:
- 2
- ISSN:
- 0935-9648
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
More Like this
-
-
We have prepared the first crystalline and 3D periodically ordered mesoporous quaternary semiconductor photocatalyst in an evaporation-induced self-assembly assisted soft-templating process. Using lab synthesized triblock-terpolymer poly(isoprene- b -styrene- b -ethylene oxide) (ISO) a highly ordered 3D interconnected alternating gyroid morphology was achieved exhibiting near and long-range order, as evidenced by small angle X-ray scattering (SAXS) and electron microscopy (TEM/SEM). Moreover, we reveal the formation process on the phase-pure construction of the material's pore-walls with its high crystallinity, which proceeds along a highly stable W 5+ compound, by both in situ and ex situ analyses, including X-ray powder diffraction (XRPD), Fourier transform infrared spectroscopy (FTIR) and electron paramagnetic resonance (EPR). The resulting photocatalyst CsTaWO 6 with its optimum balance between surface area and ordered mesoporosity ultimately shows superior hydrogen evolution rates over its non-ordered reference in photocatalytic hydrogen production. This work will help to advance new self-assembly preparation pathways towards multi-element multifunctional compounds for different applications, including improved battery and sensor electrode materials.more » « less
-
Abstract Graphene's emergence enables creating chiral metamaterials in helical shapes for terahertz (THz) applications, overcoming material limitations. However, practical implementation remains theoretical due to fabrication challenges. This paper introduces a dual‐component self‐assembly technique that enables creating vertically‐aligned continuous monolayer graphene helices at microscale with great flexibility and high controllability. This assembly process not only facilitates the creation of 3D microstructures, but also positions the 3D structures from a horizontal to a vertical orientation, achieving an aspect ratio (height/width) of ≈2700. As a result, an array of vertically‐aligned graphene helices is formed, reaching up to 4 mm in height, which is equivalent to 4 million times the height of monolayer graphene. The benefit of these 3D chiral structures made from graphene is their capability to infinitely extend in height, interacting with light in ways that are not possible with traditional 2D layering methods. Such an impressive height elevates a level of interaction with light that far surpasses what is achievable with traditional 2D layering methods, resulting in a notable enhancement of optical chirality properties. This approach is applicable to various 2D materials, promising advancements in innovative research and diverse applications across fields.more » « less
-
Abstract Source/Drain extension doping is crucial for minimizing the series resistance of the ungated channel and reducing the contact resistance of field‐effect transistors (FETs) in complementary metal–oxide–semiconductor (CMOS) technology. 2D semiconductors, such as MoS2and WSe2, are promising channel materials for beyond‐silicon CMOS. A key challenge is to achieve extension doping for 2D monolayer FETs without damaging the atomically thin material. This work demonstrates extension doping with low‐resistance contacts for monolayer WSe2p‐FETs. Self‐limiting oxidation transforms a bilayer WSe2into a hetero‐bilayer of a high‐work‐function WOxSeyon a monolayer WSe2. Then, damage‐free nanolithography defines an undoped nano‐channel, preserving the high on‐current of WOxSey‐doped FETs while significantly improving their on/off ratio. The insertion of an amorphous WOxSeyinterlayer under the contacts achieves record‐low contact resistances for monolayer WSe2over a hole density range of 1012to 1013cm−2(1.2 ± 0.3 kΩ µm at 1013cm−2). The WOxSey‐doped extension exhibits a sheet resistance as low as 10 ± 1 kΩ □−1. Monolayer WSe2p‐FETs with sub‐50 nm channel lengths reach a maximum drain current of 154 µA µm−1with an on/off ratio of 107–108. These results define strategies for nanometer‐scale selective‐area doping in 2D FETs and other 2D architectures.more » « less
-
Abstract Polymer nanocomposites are made by combining a nanoscale filler with a polymer matrix, where polymer‐particle interactions can enhance matrix properties and introduce behaviors distinct from either component. Manipulating particle organization within a composite potentially allows for better control over polymer‐particle interactions, and the formation of ordered arrays can introduce new, emergent properties not observed in random composites. However, self‐assembly of ordered particle arrays typically requires weak interparticle interactions to prevent kinetic traps, making these assemblies incompatible with most conventional processing techniques. As a result, more fundamental investigations are needed into methods to provide additional stability to these lattices without disrupting their internal organization. The authors show that the addition of free polymer chains to the assembly solution is a simple means to increase the stability of nanoparticle superlattices against thermal dissociation. By adding high concentrations (>50 mg mL−1) of free polymer to nanoparticle superlattices, it is possible to significantly elevate their thermal stability without adversely affecting ordering. Moreover, polymer topology, molecular weight, and concentration can also be used as independent design handles to tune this behavior. Collectively, this work allows for a wider range of processing conditions for generating future nanocomposites with complete control over particle organization within the material.more » « less
