An official website of the United States government
Nanolenses are gaining importance in nanotechnology, but their challenging fabrication is thwarting their wider adoption. Of particular challenge is facile control of the lens’ curvature. In this work, we demonstrate a new nanoimprinting technique capable of realizing polymeric nanolenses in which the nanolens’ curvature is optically controlled by the ultraviolet (UV) dose at the pre-curing step. Our results reveal a regime in which the nanolens’ height changes linearly with the UV dose. Computational modeling further uncovers that the polymer undergoes highly nonlinear dynamics during the UV-controlled nanoimprinting process. Both the technique and the process model will greatly advance nanoscale science and manufacturing technology.
more »
« less
Highly nonlinear behavior of UV-curable photopolymer under elastomer-templated low-pressure nanoimprinting
Understanding the dynamic behavior of photopolymers in nanoscale environment is essential to improving MEMS/NEMS device fabrication technologies. Here, we unveil the highly nonlinear behaviors of photopolymers exhibited during the process of light-controlled, low-pressure nanoimprinting. Such peculiarities can complicate the relation between the UV-dose and the height of the nanoimprinted feature, degrading the accuracy of the height control. To address the issue, we establish a theoretical process model and used the control of the nanoimprinting height for structural coloring applications. Our findings will broadly benefit nanotechnology and nanoscience.
more »
« less
- Award ID(s):
- 2129796
- PAR ID:
- 10535357
- Editor(s):
- Piyawattanametha, Wibool; Park, Yong-Hwa; Zappe, Hans
- Publisher / Repository:
- SPIE
- Date Published:
- ISBN:
- 9781510670587
- Page Range / eLocation ID:
- 32
- Format(s):
- Medium: X
- Location:
- San Francisco, United States
- Sponsoring Org:
- National Science Foundation
More Like this
-
-
Piyawattanametha, Wibool; Park, Yong-Hwa; Zappe, Hans (Ed.)Recently, there have been notable advances in nanophotonic structural color generation which enabled various applications in display, anti-counterfeiting, sensors and detectors. However, most advances in this domain have been achieved through the use of high-index materials which require expensive and complex fabrication. In this work, we enable low-index polymer nanostructures to generate structural colors using the multipolar decomposition technique which allows a better understanding and design of the scattering process by identifying the dominant multipole modes from the scattered fields. We set a polymeric (n~1.56) cuboid as the structural color generation platform, examined the contributions of various multipoles from the wave scattered by it, and synthesized the desired color spectrum by adjusting only the height of the cuboid. To validate our findings, we fabricated the designed structural color pixels via light-controlled, low-pressure nanoimprinting and measured the color and spectrum from them. Our experimental results agreed well with the simulation results, providing insights for bringing further advances to structural coloring.more » « less
-
Nanoimprinting has been applied in many micro- and nanoscale engineered devices; applications include displays, organic electronics, photovoltaics, optical films, and optoelectronics; and in some cases, direct imprinting of functional polymeric devices. Applications in the photonics area can significantly relieve the stringent requirement needed for nanoelectronics. We provide examples of structural colors and optical meta-surfaces facilitated by nanoimprinting, as well as plasmonic lithography masks that can produce deep-subwavelength structures using ordinary UV light. Inkjet printing has been widely used in many applications, but still faces challenges in pattern precision and feature variations. Combining Nanoimprint for patterning and inkjet printing for material deposition will take the advantage of what both technologies can offer, and can provide a high precision additive manufacturing process. We will show printed photonic devices, e.g. electro-optic polymer based optical modulators. To extend nanoimprinting to solid materials other than polymeric films will require innovative and non-conventional approaches. One such process is Metal-assisted chemical (Mac) imprint, which combines MacEtch and nanoiprint and enables direct MacEtch of Si substrate using a hybrid imprinting mold having noble metal mask. However, only low aspect ratio structures have been obtained because of the mass-transport limitation in the previous molds. Recently we effectively solved this problem by a using a specially made mold of Pt-coated anodized aluminum oxide (AAO) membrane, where the holes through the entire thickness drastically enhances the mass-transport. As a result, very high aspect ratio Si nanowires were achieved by MacImprint.more » « less
-
Nanoimprinting of gold has the potential to make significant impact in the fabrication of miniaturized devices including optical devices, photonic crystals and biochemical sensors. The deformation behavior and recrystallization of gold structures has profound impact on the accurate replication of the imprinted pattern. An important step in the nanoimprint lithography (NIL) process is the cooling of the mold and resist assembly to room temperatures. The rate of cooling, commonly termed as quenching determines the final shape of the NIL features. Molecular dynamics simulations were implemented to study the nanoimprinting of gold substrates using a silicon mold. Simulations were conducted at room temperature (298 K), gold recrystallization (473K) and melting point (1000K) temperatures. The effect of different cooling rates (quenching) on the deformation behavior and spring back of gold was investigated. These include 0.01ns, 0.05ns, and 0.2ns time steps of quenching at 1fs per time step. The modified embedded atom method (MEAM) potential was used for the system molecules. Fast cooling at 298 K and 473 K whereas, intermediate cooling at 1000 K resulted in good pattern transfer. High fidelity nanoscale features were achieved with a gradient cooling proportional to the initial heating temperatures. The findings of this research provide insight on the effect of quenching in the material deformation and spring back during direct metal nanoimprinting.more » « less
-
Ultraviolet (UV) printing of photopolymers is a widely adopted manufacturing method because of its high resolution and throughput. However, available printable photopolymers are typically thermosets, resulting in challenges in postprocessing and recycling of printed structures. Here, we present a new process called interfacial photopolymerization (IPP) which enables photopolymerization printing of linear chain polymers. In IPP, a polymer film is formed at the interface between two immiscible liquids, one containing a chain-growth monomer and the other containing a photoinitiator. We demonstrate the integration of IPP in a proof-of-concept projection system for printing of polyacrylonitrile (PAN) films and rudimentary multi-layer shapes . IPP shows in-plane and out-of-plane resolutions comparable to conventional photoprinting methods. Cohesive PAN films with number-average molecular weights greater than 15 kg mol–1 are obtained, and to our knowledge this is the first report of photopolymerization printing of PAN. A macrokinetics model of IPP is developed to elucidate the transport and reaction rates involved and evaluate how reaction parameters affect film thickness and print speed. Last, demonstration of IPP in a multilayer scheme suggests its suitabiliy for three-dimensional printing of linear-chain polymers.more » « less
- Free Publicly Accessible Full Text
-
Accepted Manuscript1.0
- Conference Paper:
- https://doi.org/10.1117/12.3001841
