skip to main content
US FlagAn official website of the United States government
dot gov icon
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
https lock icon
Secure .gov websites use HTTPS
A lock ( lock ) or https:// means you've safely connected to the .gov website. Share sensitive information only on official, secure websites.


Title: Inverted Scanning Microwave Microscopy of GaN/AlN High-Electron Mobility Transistors
In this paper, an inverted scanning microwave microscope (iSMM) is used to characterize the channel of a gateless GaN/AlN high-electron-mobility transistor (HEMT). Unlike conventional SMM, iSMM allows for 2-port measurements. Unlike conventional iSMM, the present iSMM probe is connected to Port 1 of a vector network analyzer with the HEMT drain and source remain on Port 2. Under different DC biases VGS (applied through the iSMM probe) and VDS (kept constant at 1 V), changes in both reflection coefficient S11 and transmission coefficient S21 are monitored as the iSMM probe scans along the width of the channel, revealing significant nonuniformity. Additionally, changes in S11 and S21 are significant when VGS ≥ −4 V, but insignificant when VGS = −8 V, consistent with the measured threshold voltage at −6 V for a gated HEMT. These results confirm that iSMM can be used to locally modulate the channel conduction of a HEMT while monitoring its RF response, before the actual gate is added. In turn, the nonuniformity measured by the iSMM can be used to diagnose and improve HEMT materials and processes.  more » « less
Award ID(s):
2117305 2132323
PAR ID:
10542569
Author(s) / Creator(s):
; ; ; ; ; ; ;
Publisher / Repository:
IEEE
Date Published:
ISBN:
979-8-3503-6273-2
Page Range / eLocation ID:
1 to 4
Subject(s) / Keyword(s):
Scanning microwave microscope transfer characteristics two-dimensional electron gas GaN HEMT
Format(s):
Medium: X
Location:
Washington, DC, USA
Sponsoring Org:
National Science Foundation
More Like this
  1. This article presents the design of a planar MIMO (Multiple Inputs Multiple Outputs) antenna comprised of two sets orthogonally placed 1 × 12 linear antenna arrays for 5G millimeter wave (mmWave) applications. The arrays are made of probe-fed microstrip patch antenna elements on a 90 × 160 mm2 Rogers RT/Duroid 5880 grounded dielectric substrate. The antenna demonstrates S11 = −10 dB impedance bandwidth in the following 5G frequency band: 24.25–27.50 GHz. The scattering parameters of the antenna were computed by electromagnetic simulation tools, Ansys HFSS and CST Microwave Studio, and were further verified by the measured results of a fabricated prototype. To achieve a gain of 12 dBi or better over a scanning range of +/−45° from broadside, the Dolph-Tschebyscheff excitation weighting and optimum spacing are used. Different antenna parameters, such as correlation coefficient, port isolation, and 2D and 3D radiation patterns, are investigated to determine the effectiveness of this antenna for MIMO operation, which will be very useful for mmWave cellphone applications in 5G bands. 
    more » « less
  2. Abstract We present recent 2-port vector network analyzer (VNA) measurements of the complete set of scattering parameters for the antenna used within the Long Wavelength Array (LWA) and the associated front end electronics (FEEs). Full scattering parameter measurements of the antenna yield not only the reflection coefficient for each polarization, S11 and S22, but also the coupling between polarizations, S12 and S21. These had been previously modeled using simulations, but direct measurements had not been obtained until now. The measurements are used to derive a frequency dependent impedance mismatch factor (IMF) which represents the fraction of power that is passed through the antenna–FEE interface and not reflected due to a mismatch between the impedance of the antenna and the impedance of the FEE. We also present results from a two-antenna experiment where each antenna is hooked up to a separate port on the VNA. This allows for cross–antenna coupling to be measured for all four possible polarization combinations. Finally, we apply the newly measured IMF and FEE forward gain corrections to LWA data to investigate how well they remove instrumental effects. 
    more » « less
  3. Abstract The effect of hydraulic resistance on the downstream evolution of the water surface profilehin a sloping channel covered by a uniform dense rod canopy following the instantaneous collapse of a dam was examined using flume experiments. Near the head of the advancing wavefront, wherehmeets the rods, the conventional picture of a turbulent boundary layer was contrasted to a distributed drag force representation. The details of the boundary layer around the rod and any interferences between rods were lumped into a drag coefficientCd. The study demonstrated the following: In the absence of a canopy, the Ritter solution agreed well with the measurements. When the canopy was represented by an equivalent wall friction as common when employing Manning's formula with constant roughness, it was possible to match the measured wavefront speed but not the precise shape of the water surface profile. However, upon adopting a distributed drag force with a constantCd, the agreement between measured and modeledhwas quite satisfactory at all positions and times. The measurements and model calculations suggested that the shape ofhnear the wavefront was quasilinear with longitudinal distance for a constantCd. The computed constantCd(≈0.4) was surprisingly much smaller than theCd(≈1) reported in uniform flow experiments with staggered cylinders for the same element Reynolds number. This finding suggested that drag reduction mechanisms associated with unsteadiness, nonuniformity, transient waves, and other flow disturbances were more likely to play a role when compared to conventional sheltering effects. 
    more » « less
  4. The ultra-wide bandgap of Al-rich AlGaN is expected to support a significantly larger breakdown field compared to GaN, but the reported performance thus far has been limited by the use of foreign substrates. In this Letter, the material and electrical properties of Al 0.85 Ga 0.15 N/Al 0.6 Ga 0.4 N high electron mobility transistors (HEMT) grown on a 2-in. single crystal AlN substrate are investigated, and it is demonstrated that native AlN substrates unlock the potential for Al-rich AlGaN to sustain large fields in such devices. We further study how Ohmic contacts made directly to a Si-doped channel layer reduce the knee voltage and increase the output current density. High-quality AlGaN growth is confirmed via scanning transmission electron microscopy, which also reveals the absence of metal penetration at the Ohmic contact interface and is in contrast to established GaN HEMT technology. Two-terminal mesa breakdown characteristics with 1.3  μm separation possess a record-high breakdown field strength of ∼11.5 MV/cm for an undoped Al 0.6 Ga 0.4 N-channel layer. The breakdown voltages for three-terminal devices measured with gate-drain distances of 4 and 9  μm are 850 and 1500 V, respectively. 
    more » « less
  5. Wengang, Bi; Haiding, Sun (Ed.)
    An extreme bandgap Al0.64Ga0.36N quantum channel HEMT with Al0.87Ga0.13N top and back barriers, grown by MOCVD on a bulk AlN substrate, demonstrated a critical breakdown field of 11.37 MV/cm—higher than the 9.8 MV/cm expected for the channel’s Al0.64Ga0.36N material. We show that the fraction of this increase is due to the quantization of the 2D electron gas. The polarization field maintains electron quantization in the quantum channel even at low sheet densities, in contrast to conventional HEMT designs. An additional increase in the breakdown field is due to quantum-enabled real space transfer of energetic electrons into high-Al barrier layers in high electric fields. These results show the advantages of the quantum channel design for achieving record-high breakdown voltages and allowing for superior power HEMT devices. 
    more » « less