skip to main content
US FlagAn official website of the United States government
dot gov icon
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
https lock icon
Secure .gov websites use HTTPS
A lock ( lock ) or https:// means you've safely connected to the .gov website. Share sensitive information only on official, secure websites.


Title: Temperature dependence of cathodoluminescence emission in irradiated Si-doped β-Ga2O3
Temperature dependent continuous and time-resolved cathodoluminescence measurements were employed to understand the luminescence from Si-doped β-Ga2O3 prior to irradiation and after 10 MeV proton and 18 MeV alpha-particle irradiation. The shape and location of the luminescence components [ultraviolet luminescence (UVL′) at 3.63 eV, UVL at 3.3 eV, and blue-luminescence at 2.96 eV] obtained from Gaussian decomposition did not change in either width or peak location, indicating that new radiation-induced trap-levels were non-radiative in nature between the 4.5 and 310 K temperature range. Activation energies, associated with thermal quenching of UVL′ and UVL bands, show temperature dependence, suggesting ionization of shallow Si-donors and a thermally activated non-radiative process.  more » « less
Award ID(s):
1856662 1802208
PAR ID:
10597147
Author(s) / Creator(s):
; ; ; ; ; ; ; ;
Publisher / Repository:
American Institute of Physics
Date Published:
Journal Name:
AIP Advances
Volume:
11
Issue:
12
ISSN:
2158-3226
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
More Like this
  1. The ionoluminescence of strontium titanate (SrTiO3) under the intense electronic excitation produced by 3 MeV H, 19 MeV Si, and 19 MeV Cl ions was investigated for temperatures between 30 and 100 K. In addition to previously reported emission bands centered at 2.0 eV, 2.5 eV, and 2.8 eV, an asymmetric, narrow emission band centered at 3.15 eV was observed for the first time under ion irradiation. The 3.15 eV band appeared only under heavy ion irradiation (19 MeV Si and Cl) and at temperatures below ~70 K. The absence of the 3.15 eV emission under proton irradiation indicates that impurities and the pre-irradiation defect population likely play little or no role in the emission process, while electronic excitation density does. At the same time, the absence of fluence-dependent growth in the yield suggests that irradiation-induced defects are also unlikely to be the main cause of the emission. Upon comparing the proton induced ionoluminescence, heavy ion induced ionoluminescence, and available literature on low temperature photoluminescence of strontium titanate, a self-consistent interpretation emerges, where the 3.15 eV emission is associated with the recombination of large polarons. 
    more » « less
  2. GaN samples were implanted with Be and annealed in different conditions in order to activate the shallow BeGaacceptor. Low-temperature photoluminescence spectra were studied to find BeGa-related defects in the implanted samples. A yellow band with a maximum at about 2.2 eV (the YLBeband) was observed in nearly all samples protected with an AlN cap during the annealing and in samples annealed under ultrahigh N2pressure. A green band with a maximum at 2.35 eV (the GL2 band), attributed to the nitrogen vacancy, was the dominant defect-related luminescence band in GaN samples annealed without a protective AlN layer. The ultraviolet luminescence (UVLBe) band with a maximum at 3.38 eV attributed to the shallow BeGaacceptor with the ionization energy of 0.113 eV appeared in implanted samples only after annealing at high temperatures and ultrahigh N2pressure. This is the first observation of the UVLBeband in Be-implanted GaN, indicating successful activation of the BeGaacceptor. 
    more » « less
  3. A systematic photoluminescence study of Be‐doped GaN grown by metal‐organic chemical vapor deposition is presented. All Be‐doped samples show the ultraviolet luminescence (UVLBe) band with a maximum at 3.38 eV and the yellow luminescence (YLBe) band with a maximum at ≈2.15 eV in GaN:Be having various concentrations of Be. The UVLBeband is attributed to the shallow state of the BeGaacceptor with a delocalized hole. The YLBeband is caused by a Be‐related defect, possibly the polaronic state of the BeGaacceptor with the charge transition level at 0.3 eV above the valence band. This broad band exhibits unusual properties. In particular, it always shows two steps in its thermal quenching. The second step atT ≈ 200 K is attributed to the emission of holes from the 0.3 eV level to the conduction band. The origin of the first step remains unexplained. 
    more » « less
  4. Near-ideal behavior in Schottky contacts to Si-doped AlN was observed as evidenced by a low ideality factor of 1.5 at room temperature. A temperature-independent Schottky barrier height of 1.9 eV was extracted from temperature-dependent I–V measurements. An activation energy of ∼300 meV was observed in the series resistance, which corresponded to the ionization energy of the deep Si donor state. Both Ohmic and Schottky contacts were stable up to 650 °C, with around four orders of magnitude rectification at this elevated temperature. These results demonstrate the potential of AlN as a platform for power devices capable of operating in extreme environments. 
    more » « less
  5. GaN samples are implanted with Be and F and annealed in different conditions to activate the BeGaacceptors. Photoluminescence spectra are studied to recognize the defects. The UVLBeband with a maximum at 3.38 eV and the YLBeband with a maximum at 2.15 eV are observed and associated with Be. The sequential implantation of Be and F ions into GaN at 600 °C reduces the concentration of nitrogen vacancies (VN), as evidenced by the lack of the green luminescence band associated with the isolated nitrogen vacancy. First‐principles calculations are employed to find parameters of defects that can form after implantation. 
    more » « less