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To increase the storage capacity of hard disk drives, Heat-Assisted Magnetic Recording (HAMR) takes advantage of laser heating to temporarily reduce the coercivity of recording media, enabling the writing of very small data bits on materials with high thermal stability. One key challenge in implementing HAMR is effective thermal management, which requires reliable determination of the thermal properties of HAMR materials over their range of operating temperature. This work reports the thermal properties of dielectric (amorphous silica, amorphous alumina, and AlN), metallic (gold and copper), and magnetic alloy (NiFe and CoFe) thin films used in HAMR heads from room temperature to 500 K measured with time-domain thermoreflectance. Our results show that the thermal conductivities of amorphous silica and alumina films increase with temperature, following the typical trends for amorphous materials. The polycrystalline AlN film exhibits weak thermal anisotropy, and its in-plane and through-plane thermal conductivities decrease with temperature. The measured thermal conductivities of AlN are significantly lower than that which would be present in single-crystal bulk material, and this is attributed to enhanced phonon-boundary scattering and phonon-defect scattering. The gold, copper, NiFe, and CoFe films show little temperature dependence in their thermal conductivities over the same temperature range. The measured thermal conductivities of gold and copper films are explained by the diffuse electron-boundary scattering using an empirical model.
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This content will become publicly available on June 9, 2026
Size effects and temperature dependence in the thermal conductivity of γ-Ga2O3 films
The thermal conductivities of (100) γ-Ga2O3 films deposited on (100) MgAl2O4 substrates with various thicknesses were measured using frequency-domain thermoreflectance. The measured thermal conductivities of γ-Ga2O3 films are lower than the thermal conductivities of (2¯ 01) β-Ga2O3 films of comparable thickness, which suggests that γ-phase inclusions in the doped or alloyed β-phase may affect its thermal conductivity. The thermal conductivity of γ-Ga2O3 increases from 2.3−0.5+0.9 to 3.5±0.7 W/m K for films with thicknesses of 75–404 nm, which demonstrates a prominent size effect on thermal conductivity. The thermal conductivity of γ-Ga2O3 also shows a slight increase as temperature increases from 293 to 400 K. This increase in thermal conductivity occurs when defect and boundary scattering suppress signatures of temperature-dependent Umklapp scattering. γ-Ga2O3 has a cation-defective spinel structure with at least two gallium vacancies in every unit cell, which are the likely source of defect scattering.
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- Award ID(s):
- 2324375
- PAR ID:
- 10629659
- Publisher / Repository:
- AIP Publishing
- Date Published:
- Journal Name:
- Applied Physics Letters
- Volume:
- 126
- Issue:
- 23
- ISSN:
- 0003-6951
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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