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The ionization fraction is a key figure of merit for optimizing the performance of plasma device. This work presents an optical emission spectroscopy (OES) method to determine the ionization fraction in low-temperature xenon plasma. The emission line-ratio of xenon ionic and atomic 6p–6stransitions is used in this method. A comprehensive collisional-radiative model developed in our previous work is employed to describe the relationship between the line-ratios and the plasma parameters. It is found that some special line-ratios have a sensitive relationship to the ionization fraction, e.g. the ratio of the 460.30 nm line and 828.01 nm lines. These line-ratios are selected for the diagnostic method. The method is demonstrated in a magnetized discharge chamber. The axially-resolved emission spectra of the ionization chamber are measured, and from those the ionization fraction along the chamber axis is determined via the OES method. The axially-resolved ionization fraction is found to be dependent on the magnetic field and agrees well with those obtained from a Langmuir probe. In the experiment, the probe is overheated under some conditions, possibly due to the bombardment by energetic particles. In this case, no results can be obtained from the probe, while the OES method can still obtain reasonable results. Combined with optical tomography and spectral imaging technology, the OES method can also provide the spatial distribution of the ionization fraction, which is needed for revealing the discharge mechanisms of plasma devices.

The Quantemol database (QDB) provides cross sections and rates of processes important for plasma models; heavy particle collisions (chemical reactions) and electron collision processes are considered. The current version of QDB has data on 28 917 processes between 2485 distinct species plus data for surface processes. These data are available via a web interface or can be delivered directly to plasma models using an application program interface; data are available in formats suitable for direct input into a variety of popular plasma modeling codes including HPEM, COMSOL, ChemKIN, CFD-ACE+, and VisGlow. QDB provides ready assembled plasma chemistries plus the ability to build bespoke chemistries. The database also provides a Boltzmann solver for electron dynamics and a zero-dimensional model. Thesedevelopments, use cases involving O₂, Ar/NF₃, Ar/NF₃/O₂, and He/H₂O/O₂chemistries, and plans for the future are presented.

Within the framework of the improved quantitative rescattering (QRS) model, we simulate the correlated two-electron momentum distributions (CMDs) for nonsequential double ionization (NSDI) of Ar by elliptically polarized laser pulses with a wavelength of 788 nm at an intensity of 0.7 × 10¹⁴W/cm²for the ellipticities ranging from 0 to 0.3. Only the CMDs for recollision excitation with subsequent ionization (RESI) are calculated and the contribution from recollision direct ionization is neglected. According to the QRS model, the CMD for RESI can be factorized as a product of the parallel momentum distribution (PMD) for the first released electron after recollision and the PMD for the second electron ionized from an excited state of the parent ion. The PMD for the first electron is obtained from the laser-free differential cross sections for electron impact excitation of Ar⁺calculated using state-of-the-art many-electronR-matrix theory while that for the second electron is evaluated by solving the time-dependent Schrödinger equation. The results show that the CMDs for all the ellipticities considered here exhibit distinct anticorrelated back-to-back emission of the electrons along the major polarization direction, and the anticorrelation is more pronounced with increasing ellipticity. It is found that anticorrelation is attributed to the pattern of the PMD for the second electron ionized from the excited state that, in turn, is caused by the delayed recollision time with respect to the instant of the external field crossing. Our work shows that both the ionization potential of the excited parent ion and the laser intensity play important roles in the process.