The device concept of ferroelectric-based negative capacitance (NC) transistors offers a promising route for achieving energy-efficient logic applications that can outperform the conventional semiconductor technology, while viable operation mechanisms remain a central topic of debate. In this work, we report steep slope switching in MoS2transistors back-gated by single-layer polycrystalline PbZr0.35Ti0.65O3. The devices exhibit current switching ratios up to 8 × 106within an ultra-low gate voltage window of
- Award ID(s):
- 1814756
- Publication Date:
- NSF-PAR ID:
- 10056027
- Journal Name:
- International Electron Device Meetings
- Page Range or eLocation-ID:
- 13.5.1 to 13.5.4
- Sponsoring Org:
- National Science Foundation
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Abstract V and subthreshold swing (SS) as low as 9.7 mV decade−1at room temperature, transcending the 60 mV decade−1Boltzmann limit without involving additional dielectric layers. Theoretical modeling reveals the dominant role of the metastable polar states within domain walls in enabling the NC mode, which is corroborated by the relation between SS and domain wall density. Our findings shed light on a hysteresis-free mechanism for NC operation, providing a simple yet effective material strategy for developing low-power 2D nanoelectronics.$$V_{{{\mathrm{g}}}} = \pm \! 0.5$$ -
Abstract The minimization of the subthreshold swing (SS) in transistors is essential for low‐voltage operation and lower power consumption, both critical for mobile devices and internet of things (IoT) devices. The conventional metal‐oxide‐semiconductor field‐effect transistor requires sophisticated dielectric engineering to achieve nearly ideal SS (60 mV dec−1at room temperature). However, another type of transistor, the junction field‐effect transistor (JFET) is free of dielectric layer and can reach the theoretical SS limit without complicated dielectric engineering. The construction of a 2D SnSe/MoS2van der Waals (vdW) heterostructure‐based JFET with nearly ideal SS is reported. It is shown that the SnSe/MoS2vdW heterostructure exhibits excellent p–n diode rectifying characteristics with low saturate current. Using the SnSe as the gate and MoS2as the channel, the SnSe/MoS2vdW heterostructure exhibit well‐behavioured n‐channel JFET characteristics with a small pinch‐off voltage
V Pof −0.25 V, nearly ideal subthreshold swing SS of 60.3 mV dec−1and high ON/OFF ratio over 106, demonstrating excellent electronic performance especially in the subthreshold regime. -
The ultra-wide bandgap of Al-rich AlGaN is expected to support a significantly larger breakdown field compared to GaN, but the reported performance thus far has been limited by the use of foreign substrates. In this Letter, the material and electrical properties of Al 0.85 Ga 0.15 N/Al 0.6 Ga 0.4 N high electron mobility transistors (HEMT) grown on a 2-in. single crystal AlN substrate are investigated, and it is demonstrated that native AlN substrates unlock the potential for Al-rich AlGaN to sustain large fields in such devices. We further study how Ohmic contacts made directly to a Si-doped channel layer reduce the knee voltage and increase the output current density. High-quality AlGaN growth is confirmed via scanning transmission electron microscopy, which also reveals the absence of metal penetration at the Ohmic contact interface and is in contrast to established GaN HEMT technology. Two-terminal mesa breakdown characteristics with 1.3 μm separation possess a record-high breakdown field strength of ∼11.5 MV/cm for an undoped Al 0.6 Ga 0.4 N-channel layer. The breakdown voltages for three-terminal devices measured with gate-drain distances of 4 and 9 μm are 850 and 1500 V, respectively.
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Abstract Ferroelectric (FE) devices are conventionally switched by an application of an electric field. However, the recent discoveries of light–matter interactions in heterostructures based on 2D semiconductors and FE materials open new opportunities for using light as an additional tool for device programming. Recently, a purely optical switching of FE polarization in heterostructures comprising 2D MoS2and FE oxide perovskites, such as BaTiO3and Pb(Zr,Ti)O3(PZT), was demonstrated. In this work, it is investigated whether this optical switching has a practical value and can be used to improve functional characteristics of MoS2‐PZT FE field‐effect transistors for nonvolatile memory applications. It is demonstrated that the combined use of an electrical field and visible light improves the nonvolatile ON/OFF ratios in MoS2‐PZT memories by several orders of magnitude compared to their purely electrical operation. The memories are read at zero gate voltage (
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