An official website of the United States government
Epitaxial W–Mo multilayers are employed as a model system to demonstrate how resistivity measurements parallel to metal–metal interfaces can be used to quantify the specific interface resistance without sub-10-nm patterning that would be required for direct transport measurements across the interface. 50-nm-thick epitaxial multilayer stacks containing 2–60 individual W(001) and Mo(001) layers are deposited on MgO(001) substrates and their resistivity ρ measured as a function of superlattice period Λ at 293 and 77 K. The measured room temperature ρ increases from 7.10 to 8.62 μΩ cm with decreasing Λ = 50–1.7 nm, which is attributed to the increasing electron-interface scattering. The semiclassical Fuchs–Sondheimer model for surface scattering dramatically overestimates the resistivity, which is attributed to coherent electron transmission across multiple interfaces. A new Boltzmann transport model treats each interface as a boundary condition where electrons either scatter diffusely or traverse without momentum loss with a probability T for the first encountered interface and with 100% transmission at subsequent interfaces until they are relaxed by a bulk scattering event. This model has a single unknown parameter T, which becomes the fitting parameter for experimental data analysis, yielding a temperature-independent T = 0.8 ± 0.1 and a corresponding contact resistance at the W(001)–Mo(001) interface of 2.6 × 10−16 Ω m2.
more »
« less
A new semiconductor: Ti0.5Mg0.5N(001)
Ti0.5Mg0.5N has recently been predicted to be a semiconductor with a 1.3 eV band gap and promising properties for thermoelectric and plasmonic devices. As a first step towards experimental validation, epitaxial Ti0.5Mg0.5N(001) layers are deposited on MgO(001) by reactive magnetron co-sputtering from titanium and magnesium targets at 600 °C in pure N2 atmospheres. X-ray diffraction ω-2θ scans, ω-rocking curves, φ-scans, and high resolution reciprocal space maps show that Ti0.5Mg0.5N alloys form a pseudobinary rocksalt structure and are single crystals with a cube-on-cube epitaxial relationship with the substrate: (001)TiMgN║(001)MgO and [100]TiMgN║[100]MgO. A 275-nm-thick Ti0.5Mg0.5N layer is fully relaxed and exhibits a 002 ω-rocking curve width ω = 0.73°, while a 36-nm-thick layer is fully strained and has a ω = 0.49°. These results indicate a thickness-dependent strain state which suggests a critical thickness for misfit dislocation nucleation and glide which is between 36 and 275 nm. A measured negative temperature coefficient of resistivity in combination with a low optical absorption coefficient of 0.25 × 105 cm 1 for λ = 740 nm, and a vanishing density of states at the Fermi level measured by x-ray photoelectron spectroscopy support the prediction that Ti0.5Mg0.5N is a semiconductor.
more »
« less
- PAR ID:
- 10089435
- Date Published:
- Journal Name:
- 2018 IEEE Nanotechnology Symposium (ANTS), Albany, NY, 2018
- Page Range / eLocation ID:
- 1 to 5
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
More Like this
-
-
Abstract As a promising alternative to the mainstream CoFeB/MgO system with interfacial perpendicular magnetic anisotropy (PMA),L10‐FePd and its synthetic antiferromagnet (SAF) structure with large crystalline PMA can support spintronic devices with sufficient thermal stability at sub‐5 nm sizes. However, the compatibility requirement of preparingL10‐FePd thin films on Si/SiO2wafers is still unmet. In this paper, high‐qualityL10‐FePd and its SAF on Si/SiO2wafers are prepared by coating the amorphous SiO2surface with an MgO(001) seed layer. The preparedL10‐FePd single layer and SAF stack are highly (001)‐textured, showing strong PMA, low damping, and sizeable interlayer exchange coupling, respectively. Systematic characterizations, including advanced X‐ray diffraction measurement and atomic resolution‐scanning transmission electron microscopy, are conducted to explain the outstanding performance ofL10‐FePd layers. A fully‐epitaxial growth that starts from MgO seed layer, induces the (001) texture ofL10‐FePd, and extends through the SAF spacer is observed. This study makes the vision of scalable spintronics more practical.more » « less
-
Bismuth ferrite layers, ∼200-nm-thick, are deposited on SrRuO3-coated DyScO3(110)o substrates in a step-flow growth regime via adsorption-controlled molecular-beam epitaxy. Structural characterization shows the films to be phase pure with substrate-limited mosaicity (0.012° x-ray diffraction ω-rocking curve widths). The film surfaces are atomically smooth (0.2 nm root-mean-square height fluctuations) and consist of 260-nm-wide [11¯1]o-oriented terraces and unit-cell-tall (0.4 nm) step edges. The combination of electrostatic and symmetry boundary conditions promotes two monoclinically distorted BiFeO3 ferroelectric variants, which self-assemble into a pattern with unprecedentedly coherent periodicity, consisting of 145 ± 2-nm-wide stripe domains separated by [001]o-oriented 71° domain walls. The walls exhibit electrical rectification and enhanced conductivity.more » « less
-
MnO(001) thin films were grown on commercial MgO(001) substrates at 520 °C by reactive molecular beam epitaxy (MBE) using Mn vapor and O2-seeded supersonic molecular beams (SMBs) both with and without radio frequency (RF) plasma excitation. For comparison, MnO(001) films were grown by reactive MBE using O2 from a leak valve. X-ray photoelectron spectroscopy confirmed the Mn2+ oxidation state and 10%–15% excess oxygen near the growth surface. Reflection high-energy electron diffraction and x-ray diffraction evidenced that the films were rock salt cubic MnO with very strong (001) orientation. High-angle annular dark field scanning transmission electron microscopy with energy-dispersive x-ray spectroscopy demonstrated abrupt MnO/MgO interfaces and indicated [(001)MnO||(001)MgO] epitaxial growth. Ex situ atomic force microscopy of films deposited without RF excitation revealed smooth growth surfaces. An SMB-grown MnO(001) film was converted to Mn3O4 with strong (110) orientation by post-growth exposure to an RF-discharge (RFD) SMB source providing O atoms; the surface of the resultant film contained elongated pits aligned with the MgO110 directions. In contrast, using the RFD-SMB source for growth resulted in MnO(001) films with elongated growth pits and square pyramidal hillocks aligned along the MgO110 and 100 directions, respectively.more » « less
-
Two distinct ultra-thin Ge1−xSnx (x ≤ 0.1) epilayers were deposited on (001) Si substrates at 457 and 313 °C through remote plasma-enhanced chemical vapor deposition. These films are considered potential initiation layers for synthesizing thick epitaxial GeSn films. The GeSn film deposited at 313 °C has a thickness of 10 nm and exhibits a highly epitaxial continuous structure with its lattice being compressed along the interface plane to coherently match Si without mismatch dislocations. The GeSn film deposited at 457 °C exhibits a discrete epitaxial island-like morphology with a peak height of ∼30 nm and full-width half maximum (FWHM) varying from 20 to 100 nm. GeSn islands with an FWHM smaller than 20 nm are defect free, whereas those exceeding 25 nm encompass nanotwins and/or stacking faults. The GeSn islands form two-dimensional modulated superlattice structures at the interface with Si. The GeSn film deposited at 457 °C possesses a lower Sn content compared to the one deposited at lower temperature. The potential impact of using these two distinct ultra-thin layers as initiation layers for the direct growth of thicker GeSn epitaxial films on (001) Si substrates is discussed.more » « less
- Free Publicly Accessible Full Text
-
Accepted Manuscript1.0
- Conference Paper:
- https://doi.org/10.1109/NANOTECH.2018.8653564
