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Title: Effect of Al 2 O 3 Seed-Layer on the Dielectric and Electrical Properties of Ultrathin MgO Films Fabricated Using In Situ Atomic Layer Deposition
Award ID(s):
1809293 1909292 1508494
PAR ID:
10110059
Author(s) / Creator(s):
; ; ; ;
Date Published:
Journal Name:
ACS Applied Materials & Interfaces
ISSN:
1944-8244
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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