skip to main content
US FlagAn official website of the United States government
dot gov icon
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
https lock icon
Secure .gov websites use HTTPS
A lock ( lock ) or https:// means you've safely connected to the .gov website. Share sensitive information only on official, secure websites.

Explore Research Products in the PAR
It may take a few hours for recently added research products to appear in PAR search results.


  • NSF Public Access
  • Search Results
  • Patterning nickel for extreme ultraviolet lithography mask application. II. Hybrid reactive ion etch and atomic layer etch processing
Title: Patterning nickel for extreme ultraviolet lithography mask application. II. Hybrid reactive ion etch and atomic layer etch processing
Award ID(s):
1805112
PAR ID:
10167011
Author(s) / Creator(s):
 ;  
Publisher / Repository:
American Vacuum Society
Date Published:
Journal Name:
Journal of Vacuum Science & Technology A
Volume:
38
Issue:
4
ISSN:
0734-2101
Page Range / eLocation ID:
Article No. 042604
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
More Like this
  1. ; ; ; (, Journal of Materials Research)
  2. ; ; ; (, Proc. SPIE 12056, Advanced Etch Technology and Process Integration for Nanopatterning XI)
    Bannister, Julie; Mohanty, Nihar (Ed.)
  3. ; ; ; (, ECS Transactions)
  4. ; ; ; ; ; ; ; (, Journal of Vacuum Science & Technology A)
  5. ; ; ; (, SPIE)
    Osiński, Marek; Arakawa, Yasuhiko; Witzigmann, Bernd (Ed.)
  • Citation Formats
  • MLA
  • APA
  • Chicago
  • BibTeX
  • Save / Share this Record
  • Send to Email