- Award ID(s):
- 1939144
- NSF-PAR ID:
- 10215743
- Date Published:
- Journal Name:
- IEEE Journal of Emerging and Selected Topics in Power Electronics
- ISSN:
- 2168-6777
- Page Range / eLocation ID:
- 1 to 1
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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Due to its fast switching speed, the voltage sharing of series-connected SiC MOSFETs is more sensitive to the parasitic components from the power modules and the system, which results in more challenges for voltage balancing control. For two series-connected SiC MOSFETs realized by one half-bridge module, the detailed analysis and measurement indicate that the unbalanced parasitic capacitors inside the power module comprise the dominant factor causing the difference of turn-off dv/dt. In this paper, the traditional gate turn-off delay-time control is first used as an example to analyze the limitation of the existing active voltage balancing (AVB) control methods under AC load current: 1) AVB control has a limitation to adjust delay time accurately under AC current; 2) the voltage imbalance of the body diodes cannot be solved by AVB control. To achieve voltage balancing control of series-connected SiC MOSFETs and body diodes, this paper proposes a new two-part hybrid approach: 1) passive dv/dt compensation: one small compensation capacitor is applied to balance the non-uniform distribution of parasitic capacitors inside the power module, so the series-connected MOSFETs can have the same turn-off dv/dt; 2) active gate signal turn-off time adjustment: a closed-loop delay time control is applied to compensate the gate signal mismatch of MOSFETs. To verify the proposed balancing approach, a single-phase pump-back test is conducted to show the improvement of voltage sharing of both MOSFETs and body diodes.more » « less
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High dv/dt from the emerging SiC variable-frequency drives can easily induce overvoltage across the motor stator winding terminals, especially for long-cable-connected and high-voltage motor-drive systems. Due to the fast switching speed and surge impedance mismatch between cables and motors, this overvoltage can be two times or even higher than the DC-bus voltage of the inverter, resulting in motor insulation degradation or irreversible breakdown. The most common solution to mitigate such overvoltage is to install a dv/dt or a sinewave filter at the output of the drive, which decreases the efficiency and power density of the system. Among different stator coils, the first one (close to the drive side) is the most susceptible to insulation breakdown since it experiences higher overvoltage than the others due to the nonlinear distribution of the reflected surge voltages. In this paper, an innovative high-efficiency ultracompact mitigation solution is introduced, which is a tiny auxiliary circuit embedded inside the motor stator (or at the motor terminal box), specifically across the first few coils of each phase (i.e., smart coils). The proposed smart coil circuit effectively mitigates the surge overvoltage, which can be scalable to any type of motor-drive systems, regardless of cable length and semiconductor rise time. The proposed solution can dramatically improve the reliability, efficiency, and power density of motor-drive systems.more » « less
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By mimicking biomimetic synaptic processes, the success of artificial intelligence (AI) has been astounding with various applications such as driving automation, big data analysis, and natural-language processing.[1-4] Due to a large quantity of data transmission between the separated memory unit and the logic unit, the classical computing system with von Neumann architecture consumes excessive energy and has a significant processing delay.[5] Furthermore, the speed difference between the two units also causes extra delay, which is referred to as the memory wall.[6, 7] To keep pace with the rapid growth of AI applications, enhanced hardware systems that particularly feature an energy-efficient and high-speed hardware system need to be secured. The novel neuromorphic computing system, an in-memory architecture with low power consumption, has been suggested as an alternative to the conventional system. Memristors with analog-type resistive switching behavior are a promising candidate for implementing the neuromorphic computing system since the devices can modulate the conductance with cycles that act as synaptic weights to process input signals and store information.[8, 9]
The memristor has sparked tremendous interest due to its simple two-terminal structure, including top electrode (TE), bottom electrode (BE), and an intermediate resistive switching (RS) layer. Many oxide materials, including HfO2, Ta2O5, and IGZO, have extensively been studied as an RS layer of memristors. Silicon dioxide (SiO2) features 3D structural conformity with the conventional CMOS technology and high wafer-scale homogeneity, which has benefited modern microelectronic devices as dielectric and/or passivation layers. Therefore, the use of SiO2as a memristor RS layer for neuromorphic computing is expected to be compatible with current Si technology with minimal processing and material-related complexities.
In this work, we proposed SiO2-based memristor and investigated switching behaviors metallized with different reduction potentials by applying pure Cu and Ag, and their alloys with varied ratios. Heavily doped p-type silicon was chosen as BE in order to exclude any effects of the BE ions on the memristor performance. We previously reported that the selection of TE is crucial for achieving a high memory window and stable switching performance. According to the study which compares the roles of Cu (switching stabilizer) and Ag (large switching window performer) TEs for oxide memristors, we have selected the TE materials and their alloys to engineer the SiO2-based memristor characteristics. The Ag TE leads to a larger memory window of the SiO2memristor, but the device shows relatively large variation and less reliability. On the other hand, the Cu TE device presents uniform gradual switching behavior which is in line with our previous report that Cu can be served as a stabilizer, but with small on/off ratio.[9] These distinct performances with Cu and Ag metallization leads us to utilize a Cu/Ag alloy as the TE. Various compositions of Cu/Ag were examined for the optimization of the memristor TEs. With a Cu/Ag alloying TE with optimized ratio, our SiO2based memristor demonstrates uniform switching behavior and memory window for analog switching applications. Also, it shows ideal potentiation and depression synaptic behavior under the positive/negative spikes (pulse train).
In conclusion, the SiO2memristors with different metallization were established. To tune the property of RS layer, the sputtering conditions of RS were varied. To investigate the influence of TE selections on switching performance of memristor, we integrated Cu, Ag and Cu/Ag alloy as TEs and compared the switch characteristics. Our encouraging results clearly demonstrate that SiO2with Cu/Ag is a promising memristor device with synaptic switching behavior in neuromorphic computing applications.
Acknowledgement This work was supported by the U.S. National Science Foundation (NSF) Award No. ECCS-1931088. S.L. and H.W.S. acknowledge the support from the Improvement of Measurement Standards and Technology for Mechanical Metrology (Grant No. 22011044) by KRISS.
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et al. ,Journal of Big Data, vol. 2, no. 1, p. 1, 2015.[4] Zhao
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SIGARCH Comput. Archit. News, vol. 23, no. 4, pp. 4–6, 1995.[8] Ielmini
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et al. , Physica Status Solidi (RRL) - Rapid Research Letters, pssr.202200075R1, In press, 2022. -
Abstract—Wide band gap (WBG) devices, like silicon carbide (SiC) MOSFET has gradually replaced the traditional silicon counterpart due to their advantages of high operating temperature and fast switching speed. Paralleling operations of SiC MOSFETs are unavoidable in high power applications in order to meet the system current requirement. However, parasitics mismatches among different paralleling devices would cause current unbalance issues, which would reduce the system reliability and maximum current capability. Thus, to achieve current balancing operation, this paper proposes a solution of using multi-level active gate driver, where the dynamic current sharing during turn-on and turn-off processes are achieved by adjusting the delays, intermediate turn-on and turn-off voltages. The static current sharing is maintained by regulating the static turn-on gate voltage, where the on-state resistance mismatch between different devices can be compensated. A double pulse test setup with two different SiC MOSFETs is built to emulate the scenario of worst case application with large differences of threshold voltage and on-state resistance. The experimental results demonstrate that the proposed active gate driver can achieve both dynamic and static current sharing operations for SiC MOSFETs with paralleling operation. Moreover, the system control diagram is discussed. Simulation studies are conducted to achieve closed-loop control of the paralleled SiC MOSFETs with the aid of the active gate driver approach.more » « less
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The wide bandgap semiconductors SiC and GaN are commercialized for power electronics and for visible to UV light-emitting diodes in the case of the GaN/InGaN/AlGaN materials system. For power electronics applications, SiC MOSFETs (metal–oxide–semiconductor field effect transistors) and rectifiers and GaN/AlGaN HEMTs and vertical rectifiers provide more efficient switching at high-power levels than do Si devices and are now being used in electric vehicles and their charging infrastructure. These devices also have applications in more electric aircraft and space missions where high temperatures and extreme environments are involved. In this review, their inherent radiation hardness, defined as the tolerance to total doses, is compared to Si devices. This is higher for the wide bandgap semiconductors, due in part to their larger threshold energies for creating defects (atomic bond strength) and more importantly due to their high rates of defect recombination. However, it is now increasingly recognized that heavy-ion-induced catastrophic single-event burnout in SiC and GaN power devices commonly occurs at voltages ∼50% of the rated values. The onset of ion-induced leakage occurs above critical power dissipation within the epitaxial regions at high linear energy transfer rates and high applied biases. The amount of power dissipated along the ion track determines the extent of the leakage current degradation. The net result is the carriers produced along the ion track undergo impact ionization and thermal runaway. Light-emitting devices do not suffer from this mechanism since they are forward-biased. Strain has also recently been identified as a parameter that affects radiation susceptibility of the wide bandgap devices.more » « less