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Title: Organic‐Inorganic Hybrid Crystal‐Assisted Etching of Nickel Foam for the Collectively Exhaustive Electrochemical Performance of Oxygen Evolution Reaction
Abstract

In this work, an organic‐inorganic hybrid crystal, violet‐crystal (VC), was used to etch the nickel foam (NF) to fabricate a self‐standing electrode for the water oxidation reaction. The efficacy of VC‐assisted etching manifests the promising electrochemical performance towards the oxygen evolution reaction (OER), requiring only ~356 and ~376 mV overpotentials to reach 50 and 100 mA cm−2, respectively. The OER activity improvement is attributed to the collectively exhaustive effects arising from the incorporation of various elements in the NF, and the enhancement of active site density. Furthermore, the self‐standing electrode is robust, exhibiting a stable OER activity after 4,000 cyclic voltammetry cycles, and ~50 h. The anodic transfer coefficients (αa) show that the first electron transfer step is the rate‐determining step on the surface of NF‐VCs‐1.0 (NF etched by 1 g of VCs) electrode, while the chemical step involving dissociation following the first electron transfer step is identified as the rate‐limiting step in other electrodes. The lowest Tafel slope value observed in the NF‐VCs‐1.0 electrode indicates the high surface coverage of oxygen intermediates and more favorable OER reaction kinetics, as confirmed by high interfacial chemical capacitance and low charge transport/interfacial resistance. This work demonstrates the importance of VCs‐assisted etching of NF to activate the OER, and the ability to predict reaction kinetics and rate‐limiting step based onαavalues, which will open new avenues to identify advanced electrocatalysts for the water oxidation reaction.

 
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Award ID(s):
2119688
NSF-PAR ID:
10444023
Author(s) / Creator(s):
 ;  ;  ;  ;  ;  ;  ;  ;  
Publisher / Repository:
Wiley Blackwell (John Wiley & Sons)
Date Published:
Journal Name:
Chemistry – A European Journal
Volume:
29
Issue:
52
ISSN:
0947-6539
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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