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Abstract Shaping the intensity profile of a laser beam is desired by various industrial applications. In this paper, a new approach is presented to design and fabricate liquid crystal (LC) micro‐optical elements (MOEs) with engineered Pancharatnam–Berry (PB) phases for beam shaping. By generalizing the Snell's law for spatially variant PB phases, molecular orientation patterns are designed for the liquid crystal MOEs to shape a Gaussian laser beam into flattop intensity profiles with circular and square cross‐sections, with the β parameter varied from 4 to 42. It is demonstrated that such liquid crystal beam shaping MOEs can be fabricated with high throughput and high resolution by using a photopatterning technique based on plasmonic metamasks and that they produce excellent beam quality, no zero‐order light leakage with a beam size from 10 to 600 µm. As the plasmonic metamasks allow for encoding arbitrary molecular orientations, i.e., arbitrary geometric phase profiles, the approaches presented here are widely applicable to large‐scale manufacturing of liquid crystal MOEs for any beam shapes.
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Plasmonic Metasurfaces with High UV–Vis Transmittance for Photopatterning of Designer Molecular Orientations
Abstract Recent developments of utilizing plasmonic metasurfaces in photopatterning of designer molecular orientations have facilitated numerous new applications of liquid crystals; while the optical efficiency of the metamasks remains a critical issue, especially in the UV region. Here a new design of plasmonic metasurfaces made of parallelepiped arrays is presented which yield very high and broadband transmission in the UV–vis wavelength range. It is shown that this plasmonic metamask exhibits two polarization peaks originated from a cavity mode and lattice resonance respectively and demonstrated that complex designer molecular orientations can be photopatterned by using this metamask with significantly reduced exposure time. This type of high‐efficiency broadband plasmonic metasurfaces is not only important for high resolution photopatterning of molecular orientation but also tailorable for various other flat optics applications in the UV and near UV regions.
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- Award ID(s):
- 1663394
- PAR ID:
- 10461194
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- Advanced Optical Materials
- Volume:
- 7
- Issue:
- 11
- ISSN:
- 2195-1071
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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