skip to main content


Title: Wafer-Scale Synthesis of WS 2 Films with In Situ Controllable p-Type Doping by Atomic Layer Deposition

Wafer-scale synthesis of p-type TMD films is critical for its commercialization in next-generation electro/optoelectronics. In this work, wafer-scale intrinsic n-type WS2films and in situ Nb-doped p-type WS2films were synthesized through atomic layer deposition (ALD) on 8-inchα-Al2O3/Si wafers, 2-inch sapphire, and 1 cm2GaN substrate pieces. The Nb doping concentration was precisely controlled by altering cycle number of Nb precursor and activated by postannealing. WS2n-FETs and Nb-doped p-FETs with different Nb concentrations have been fabricated using CMOS-compatible processes. X-ray photoelectron spectroscopy, Raman spectroscopy, and Hall measurements confirmed the effective substitutional doping with Nb. The on/off ratio and electron mobility of WS2n-FET are as high as 105and 6.85 cm2 V-1 s-1, respectively. In WS2p-FET with 15-cycle Nb doping, the on/off ratio and hole mobility are 10 and 0.016 cm2 V-1 s-1, respectively. The p-n structure based on n- and p- type WS2films was proved with a 104rectifying ratio. The realization of controllablein situNb-doped WS2films paved a way for fabricating wafer-scale complementary WS2FETs.

 
more » « less
Award ID(s):
1720595
NSF-PAR ID:
10474722
Author(s) / Creator(s):
; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ;
Publisher / Repository:
Science Partner Journals
Date Published:
Journal Name:
Research
Volume:
2021
ISSN:
2639-5274
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
More Like this
  1. Abstract

    Semiconductive transition metal dichalcogenides (TMDs) have been considered as next generation semiconductors, but to date most device investigations are still based on microscale exfoliation with a low yield. Wafer scale growth of TMDs has been reported but effective doping approaches remain challenging due to their atomically thick nature. This work reports the synthesis of wafer‐scale continuous few‐layer PtSe2films with effective doping in a controllable manner. Chemical component analyses confirm that both n‐doping and p‐doping can be effectively modulated through a controlled selenization process. The electrical properties of PtSe2films have been systematically studied by fabricating top‐gated field effect transistors (FETs). The device current on/off ratio is optimized in two‐layer PtSe2FETs, and four‐terminal configuration displays a reasonably high effective field effect mobility (14 and 15 cm2V−1s−1for p‐type and n‐type FETs, respectively) with a nearly symmetric p‐type and n‐type performance. Temperature dependent measurement reveals that the variable range hopping is dominant at low temperatures. To further establish feasible application based on controllable doping of PtSe2, a logic inverter and vertically stacked p–n junction arrays are demonstrated. These results validate that PtSe2is a promising candidate among the family of TMDs for future functional electronic applications.

     
    more » « less
  2. Abstract

    Here we benchmark device-to-device variation in field-effect transistors (FETs) based on monolayer MoS2and WS2films grown using metal-organic chemical vapor deposition process. Our study involves 230 MoS2FETs and 160 WS2FETs with channel lengths ranging from 5 μm down to 100 nm. We use statistical measures to evaluate key FET performance indicators for benchmarking these two-dimensional (2D) transition metal dichalcogenide (TMD) monolayers against existing literature as well as ultra-thin body Si FETs. Our results show consistent performance of 2D FETs across 1 × 1 cm2chips owing to high quality and uniform growth of these TMDs followed by clean transfer onto device substrates. We are able to demonstrate record high carrier mobility of 33 cm2 V−1 s−1in WS2FETs, which is a 1.5X improvement compared to the best reported in the literature. Our experimental demonstrations confirm the technological viability of 2D FETs in future integrated circuits.

     
    more » « less
  3. Abstract

    To exploit their charge transport properties in transistors, semiconducting carbon nanotubes must be assembled into aligned arrays comprised of individualized nanotubes at optimal packing densities. However, achieving this control on the wafer‐scale is challenging. Here, solution‐based shear in substrate‐wide, confined channels is investigated to deposit continuous films of well‐aligned, individualized, semiconducting nanotubes. Polymer‐wrapped nanotubes in organic ink are forced through sub‐mm tall channels, generating shear up to 10 000 s−1uniformly aligning nanotubes across substrates. The ink volume and concentration, channel height, and shear rate dependencies are elucidated. Optimized conditions enable alignment within a ±32° window, at 50 nanotubes µm−1, on 10 × 10 cm2substrates. Transistors (channel length of 1–5 µm) are fabricated parallel and perpendicular to the alignment. The parallel transistors perform with 7× faster charge carrier mobility (101 and 49 cm2V−1s−1assuming array and parallel‐plate capacitances, respectively) with high on/off ratio of 105. The spatial uniformity varies ±10% in density, ±2° in alignment, and ±7% in mobility. Deposition occurs within seconds per wafer, and further substrate scaling is viable. Compared to random networks, aligned nanotube films promise to be a superior platform for applications including sensors, flexible/stretchable electronics, and light emitting and harvesting devices.

     
    more » « less
  4. Abstract

    Achieving high electrical conductivity and thermoelectric power factor simultaneously for n‐type organic thermoelectrics is still challenging. By constructing two new acceptor‐acceptor n‐type conjugated polymers with different backbones and introducing the 3,4,5‐trimethoxyphenyl group to form the new n‐type dopant 1,3‐dimethyl‐2‐(3,4,5‐trimethoxyphenyl)‐2,3‐dihydro‐1H‐benzo[d]imidazole (TP‐DMBI), high electrical conductivity of 11 S cm−1and power factor of 32 μW m−1 K−2are achieved. Calculations using Density Functional Theory show that TP‐DMBI presents a higher singly occupied molecular orbital (SOMO) energy level of −1.94 eV than that of the common dopant 4‐(1, 3‐dimethyl‐2, 3‐dihydro‐1H‐benzoimidazol‐2‐yl) phenyl) dimethylamine (N‐DMBI) (−2.36 eV), which can result in a larger offset between the SOMO of dopant and lowest unoccupied molecular orbital (LUMO) of n‐type polymers, though that effect may not be dominant in the present work. The doped polymer films exhibit higher Seebeck coefficient and power factor than films using N‐DMBI at the same doping levels or similar electrical conductivity levels. Moreover, TP‐DMBI doped polymer films offer much higher electron mobility of up to 0.53 cm2 V−1 s−1than films with N‐DMBI doping, demonstrating the potential of TP‐DMBI, and 3,4,5‐trialkoxy DMBIs more broadly, for high performance n‐type organic thermoelectrics.

     
    more » « less
  5. Abstract

    Achieving high electrical conductivity and thermoelectric power factor simultaneously for n‐type organic thermoelectrics is still challenging. By constructing two new acceptor‐acceptor n‐type conjugated polymers with different backbones and introducing the 3,4,5‐trimethoxyphenyl group to form the new n‐type dopant 1,3‐dimethyl‐2‐(3,4,5‐trimethoxyphenyl)‐2,3‐dihydro‐1H‐benzo[d]imidazole (TP‐DMBI), high electrical conductivity of 11 S cm−1and power factor of 32 μW m−1 K−2are achieved. Calculations using Density Functional Theory show that TP‐DMBI presents a higher singly occupied molecular orbital (SOMO) energy level of −1.94 eV than that of the common dopant 4‐(1, 3‐dimethyl‐2, 3‐dihydro‐1H‐benzoimidazol‐2‐yl) phenyl) dimethylamine (N‐DMBI) (−2.36 eV), which can result in a larger offset between the SOMO of dopant and lowest unoccupied molecular orbital (LUMO) of n‐type polymers, though that effect may not be dominant in the present work. The doped polymer films exhibit higher Seebeck coefficient and power factor than films using N‐DMBI at the same doping levels or similar electrical conductivity levels. Moreover, TP‐DMBI doped polymer films offer much higher electron mobility of up to 0.53 cm2 V−1 s−1than films with N‐DMBI doping, demonstrating the potential of TP‐DMBI, and 3,4,5‐trialkoxy DMBIs more broadly, for high performance n‐type organic thermoelectrics.

     
    more » « less