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Abstract The pursuit of smaller, energy‐efficient devices drives the exploration of electromechanically active thin films (<1 µm) to enable micro‐ and nano‐electromechanical systems. While the electromechanical response of such films is limited by substrate‐induced mechanical clamping, large electromechanical responses in antiferroelectric and multilayer thin‐film heterostructures have garnered interest. Here, multilayer thin‐film heterostructures based on antiferroelectric PbHfO3and ferroelectric PbHf1‐xTixO3overcome substrate clamping to produce electromechanical strains >4.5%. By varying the chemistry of the PbHf1‐xTixO3layer (x = 0.3‐0.6) it is possible to alter the threshold field for the antiferroelectric‐to‐ferroelectric phase transition, reducing the field required to induce the onset of large electromechanical response. Furthermore, varying the interface density (from 0.008 to 3.1 nm−1) enhances the electrical‐breakdown field by >450%. Attaining the electromechanical strains does not necessitate creating a new material with unprecedented piezoelectric coefficients, but developing heterostructures capable of withstanding large fields, thus addressing traditional limitations of thin‐film piezoelectrics.
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Direct Measurement of Inverse Piezoelectric Effects in Thin Films Using Laser Doppler Vibrometry
Further miniaturization of electronic devices necessitates the introduction of new materials, including piezoelectric thin films, that exhibit electromechanical functionalities without significant degradation in response due to substrate-induced clamping. To identify material systems with superior piezoelectric properties as thin films, simplified and quantitative electromechanical characterization techniques are required. Here, single-beam, laser Doppler vibrometry is used to detect ac electric-field-induced surface displacement in the frequency range 1–100 kHz with low error (around 6% at 10 kHz) and resolution of 0.0003 nm. The technique is used to quantify both electrostriction and piezoelectric responses (surface displacement values <0.05 nm) of various thin films. Requirements for sample geometry and device structures are established and measurement accuracy and resolution are validated against measurements from the literature via synchrotron-based diffraction measurements. A general methodology to measure and extract the piezoelectric coefficients for thin-film samples using finite-element modeling is presented and applied to determine the d33 coefficient and visualize the response in substrate-clamped 50–400-nm-thick PbZr0.52Ti0.48O3 films, especially as compared to bulk versions with the same sample geometry.
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- Award ID(s):
- 2102895
- PAR ID:
- 10515012
- Publisher / Repository:
- American Physical Society
- Date Published:
- Journal Name:
- Physical Review Applied
- Volume:
- 20
- Issue:
- 1
- ISSN:
- 2331-7019
- Page Range / eLocation ID:
- 014017
- Subject(s) / Keyword(s):
- piezoelectric electromechanical ferroelectric relaxor laser Doppler vibrometry
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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- Free Publicly Accessible Full Text
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Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1103/PhysRevApplied.20.014017
