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Selected area deposition of high purity gold films onto nanoscale 3D architectures is highly desirable as gold is conductive, inert, plasmonically active, and can be functionalized with thiol chemistries, which are useful in many biological applications. Here, we show that high-purity gold coatings can be selectively grown with the Me2Au (acac) precursor onto nanoscale 3D architectures via a pulsed laser pyrolytic chemical vapor deposition process. The selected area of deposition is achieved due to the high thermal resistance of the nanoscale geometries. Focused electron beam induced deposits (FEBID) and carbon nanofibers are functionalized with gold coatings, and we demonstrate the effects that laser irradiance, pulse width, and precursor pressure have on the growth rate. Furthermore, we demonstrate selected area deposition with a feature-targeting resolutions of ~100 and 5 µm, using diode lasers coupled to a multimode (915 nm) and single mode (785 nm) fiber optic, respectively. The experimental results are rationalized via finite element thermal modeling.
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Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser
Large-area, oblique-incidence interferometric nanopatterning using a low-cost multilongitudinal-mode diode laser as the source and a spin-on-glass based diffraction-phase-mask grating beam splitter is demonstrated. The phase mask is engineered to have only two equal intensity orders (0th and −1st), dramatically simplifying the optical arrangement and decreasing the propagation distance between the beam splitter and the sample. The low-cost, high-power (150 mW) TEM00 405-nm diode laser operates with a large number of longitudinal modes, resulting in an impractical mask-to-sample-gap proximity requirement. A dual-grating-mask, achromatic interferometric scheme is introduced to extend this gap dimension to easily accessible scales. Uniform nanopatterns with a periodicity of 600 nm were fabricated over a 1 cm diameter area using this multimode diode laser. This technique is scalable and has the potential for large-area nanopatterning applications.
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- Award ID(s):
- 1635334
- PAR ID:
- 10584286
- Publisher / Repository:
- American Vacuum Society
- Date Published:
- Journal Name:
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
- Volume:
- 39
- Issue:
- 6
- ISSN:
- 2166-2746
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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