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Abstract Photonic device development (PDD) has achieved remarkable success in designing and implementing new devices for controlling light across various wavelengths, scales, and applications, including telecommunications, imaging, sensing, and quantum information processing. PDD is an iterative, five-step process that consists of: (i) deriving device behavior from design parameters, (ii) simulating device performance, (iii) finding the optimal candidate designs from simulations, (iv) fabricating the optimal device, and (v) measuring device performance. Classically, all these steps involve Bayesian optimization, material science, control theory, and direct physics-driven numerical methods. However, many of these techniques are computationally intractable, monetarily costly, or difficult to implement at scale. In addition, PDD suffers from large optimization landscapes, uncertainties in structural or optical characterization, and difficulties in implementing robust fabrication processes. However, the advent of machine learning over the past decade has provided novel, data-driven strategies for tackling these challenges, including surrogate estimators for speeding up computations, generative modeling for noisy measurement modeling and data augmentation, reinforcement learning for fabrication, and active learning for experimental physical discovery. In this review, we present a comprehensive perspective on these methods to enable machine-learning-assisted PDD (ML-PDD) for efficient design optimization with powerful generative models, fast simulation and characterization modeling under noisy measurements, and reinforcement learning for fabrication. This review will provide researchers from diverse backgrounds with valuable insights into this emerging topic, fostering interdisciplinary efforts to accelerate the development of complex photonic devices and systems. 

We demonstrate an industrially scalable fabrication process for the integration of SiN/SiO₂single photon emitters into on-chip nanophotonic structures with sub-diffraction limited placement accuracy. 

Multilayer films with continuously varying indices for each layer have attracted great deal of attention due to their superior optical, mechanical, and thermal properties. However, difficulties in fabrication have limited their application and study in scientific literature compared to multilayer films with fixed index layers. In this work we propose a neural network based inverse design technique enabled by a differentiable analytical solver for realistic design and fabrication of single material variable-index multilayer films. This approach generates multilayer films with excellent performance under ideal conditions. We furthermore address the issue of how to translate these ideal designs into practical useful devices which will naturally suffer from growth imperfections. By integrating simulated systematic and random errors just as a deposition tool would into the optimization process, we demonstrated that the same neural network that produced the ideal device can be retrained to produce designs compensating for systematic deposition errors. Furthermore, the proposed approach corrects for systematic errors even in the presence of random fabrication imperfections. The results outlined in this paper provide a practical and experimentally viable approach for the design of single material multilayer film stacks for an extremely wide variety of practical applications with high performance.