skip to main content
US FlagAn official website of the United States government
dot gov icon
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
https lock icon
Secure .gov websites use HTTPS
A lock ( lock ) or https:// means you've safely connected to the .gov website. Share sensitive information only on official, secure websites.


Title: Molecular Dynamics Study of the Quenching Effect on Direct Nanoimprint of Gold
Nanoimprinting of gold has the potential to make significant impact in the fabrication of miniaturized devices including optical devices, photonic crystals and biochemical sensors. The deformation behavior and recrystallization of gold structures has profound impact on the accurate replication of the imprinted pattern. An important step in the nanoimprint lithography (NIL) process is the cooling of the mold and resist assembly to room temperatures. The rate of cooling, commonly termed as quenching determines the final shape of the NIL features. Molecular dynamics simulations were implemented to study the nanoimprinting of gold substrates using a silicon mold. Simulations were conducted at room temperature (298 K), gold recrystallization (473K) and melting point (1000K) temperatures. The effect of different cooling rates (quenching) on the deformation behavior and spring back of gold was investigated. These include 0.01ns, 0.05ns, and 0.2ns time steps of quenching at 1fs per time step. The modified embedded atom method (MEAM) potential was used for the system molecules. Fast cooling at 298 K and 473 K whereas, intermediate cooling at 1000 K resulted in good pattern transfer. High fidelity nanoscale features were achieved with a gradient cooling proportional to the initial heating temperatures. The findings of this research provide insight on the effect of quenching in the material deformation and spring back during direct metal nanoimprinting.  more » « less
Award ID(s):
1663128
PAR ID:
10119237
Author(s) / Creator(s):
Date Published:
Journal Name:
Proceedings of the 2019 IISE Annual Conference
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
More Like this
  1. null (Ed.)
    Understanding the deformation behavior during nanoimprint lithography is crucial for high resolution patterning. Molecular dynamics modeling was implemented to investigate the effect of different mold profiles (cylindrical, rectangular, and spherical) on the von Mises stress, lattice dislocations, and material deformation. Relatively higher von Mises stress (1.08 × 107 Pa) was observed for the spherical mold profile compared to the rectangular and cylindrical profiles due to the larger surface area of contact during the mold penetration stage of NIL. Substantial increases in the von Mises stress were observed for all the mold geometries during the mold penetration stage. The von Mises stresses had a reduction in the relaxation and mold retrieval stages based on the rearrangement of the gold atoms. The lattice dislocation during the deformation process revealed the formation of the BCC structure which further reverted to the FCC structure after the mold retrieval. The polyhedral template matching (PTM) method was used to explain the retention of the FCC structure and subsequent ductile behavior of the substrate. The cylindrical mold had the lowest percentage spring back in both of the orthogonal directions and thus replicated the mold profile with high-fidelity as compared to the spherical and rectangular molds. The findings of this research can aid the design of molds for several applications. 
    more » « less
  2. Nanoimprinting of polymers lays the foundation for several electronic and biomedical devices. Process parameter optimization have been conducted using thermal nanoimprint (T-NIL) experimentation. However, the underlying deformation mechanism of specific polymers under varying process condition needs further exploration. This research investigates the deformation behavior of poly acrylic acid (PAA) as a thermoplastic resist material for the T-NIL process. Molecular dynamics modeling was conducted on a PAA substrate imprinted with a rigid, spherical indenter. The effect of indenter size, force, and imprinting duration on the indentation depth, penetration depth, recovery depth, and recovery percentage of the polymer was evaluated. The results show that the largest indenter, regardless of force has the most significant impact on deformation behavior. The results of this research lay foundation for explaining the effect of several T-NIL process parameters on virgin PAA thermoplastic resist material. 
    more » « less
  3. Temperatures below ambient room temperature (298 K) are ideal for perovskite-sensitized upconversion devices where maximum efficiency is reached at 170 K. Here, the underlying triplet diffusion rate governs the overall upconversion dynamics. 
    more » « less
  4. Solid-state thermionic devices based on van der Waals structures were proposed for nanoscale thermal to electrical energy conversion and integrated electronic cooling applications. We study thermionic cooling across gold-graphene-WSe 2 -graphene-gold structures computationally and experimentally. Graphene and WSe 2 layers were stacked, followed by deposition of gold contacts. The I - V curve of the structure suggests near-ohmic contact. A hybrid technique that combines thermoreflectance and cooling curve measurements is used to extract the device ZT . The measured Seebeck coefficient, thermal and electrical conductance, and ZT values at room temperatures are in agreement with the theoretical predictions using first-principles calculations combined with real-space Green’s function formalism. This work lays the foundation for development of efficient thermionic devices. 
    more » « less
  5. Nanoimprinting has been applied in many micro- and nanoscale engineered devices; applications include displays, organic electronics, photovoltaics, optical films, and optoelectronics; and in some cases, direct imprinting of functional polymeric devices. Applications in the photonics area can significantly relieve the stringent requirement needed for nanoelectronics. We provide examples of structural colors and optical meta-surfaces facilitated by nanoimprinting, as well as plasmonic lithography masks that can produce deep-subwavelength structures using ordinary UV light. Inkjet printing has been widely used in many applications, but still faces challenges in pattern precision and feature variations. Combining Nanoimprint for patterning and inkjet printing for material deposition will take the advantage of what both technologies can offer, and can provide a high precision additive manufacturing process. We will show printed photonic devices, e.g. electro-optic polymer based optical modulators. To extend nanoimprinting to solid materials other than polymeric films will require innovative and non-conventional approaches. One such process is Metal-assisted chemical (Mac) imprint, which combines MacEtch and nanoiprint and enables direct MacEtch of Si substrate using a hybrid imprinting mold having noble metal mask. However, only low aspect ratio structures have been obtained because of the mass-transport limitation in the previous molds. Recently we effectively solved this problem by a using a specially made mold of Pt-coated anodized aluminum oxide (AAO) membrane, where the holes through the entire thickness drastically enhances the mass-transport. As a result, very high aspect ratio Si nanowires were achieved by MacImprint. 
    more » « less