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Title: Single-beam ion source enhanced growth of transparent conductive thin films
Abstract A single-beam ion source was developed and used in combination with magnetron sputtering to modulate the film microstructure. The ion source emits a single beam of ions that interact with the deposited film and simultaneously enhances the magnetron discharge. The magnetron voltage can be adjusted over a wide range, from approximately 240 to 130 V, as the voltage of the ion source varies from 0 to 150 V, while the magnetron current increases accordingly. The low-voltage high-current magnetron discharge enables a ‘soft sputtering mode’, which is beneficial for thin-film growth. Indium tin oxide (ITO) thin films were deposited at room temperature using a combined single-beam ion source and magnetron sputtering. The ion beam resulted in the formation of polycrystalline ITO thin films with significantly reduced resistivity and surface roughness. Single-beam ion-source-enhanced magnetron sputtering has many potential applications in which low-temperature growth of thin films is required, such as coatings for organic solar cells.  more » « less
Award ID(s):
1917577
PAR ID:
10408455
Author(s) / Creator(s):
; ; ; ; ; ; ;
Date Published:
Journal Name:
Journal of Physics D: Applied Physics
Volume:
55
Issue:
39
ISSN:
0022-3727
Page Range / eLocation ID:
395202
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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