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1. Capping Layers to Improve the Electrical Stress Stability of MoS ₂ Transistors

   https://doi.org/10.1021/acsami.0c08647  

   Doherty, James L.; Noyce, Steven G.; Cheng, Zhihui; Abuzaid, Hattan; Franklin, Aaron D. (January 2020, ACS Applied Materials & Interfaces)

   Two-dimensional (2D) materials offer exciting possibilities for numerous applications, including next-generation sensors and field-effect transistors (FETs). With their atomically thin form factor, it is evident that molecular activity at the interfaces of 2D materials can shape their electronic properties. Although much attention has focused on engineering the contact and dielectric interfaces in 2D material-based transistors to boost their drive current, less is understood about how to tune these interfaces to improve the long-term stability of devices. In this work, we evaluated molybdenum disulfide (MoS2) transistors under continuous electrical stress for periods lasting up to several days. During stress in ambient air, we observed temporary threshold voltage shifts that increased at higher gate voltages or longer stress durations, correlating to changes in interface trap states (ΔNit) of up to 1012 cm–2. By modifying the device to include either SU-8 or Al2O3 as an additional dielectric capping layer on top of the MoS2 channel, we were able to effectively reduce or even eliminate this unstable behavior. However, we found this encapsulating material must be selected carefully, as certain choices actually amplified instability or compromised device yield, as was the case for Al2O3, which reduced yield by 20% versus all other capping layers. Further refining these strategies to preserve stability in 2D devices will be crucial for their continued integration into future technologies. 

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2. Atomic layer self-transducing MoS2 vibrating channel transistors with 0.5 pm/Hz1/2 displacement sensitivity at room temperature

   https://doi.org/10.1063/5.0170127  

   Yousuf, S_M_Enamul Hoque; Feng, Philip X-L (January 2024, Applied Physics Letters)

   We report on the experimental demonstration of high-performance suspended channel transistors with single- and bilayer (1L and 2L) molybdenum disulfide (MoS2), and on operating them as vibrating channel transistors (VCTs) and exploiting their built-in dynamic electromechanical coupling to read out picoampere (pA) transconduction current directly at the vibrating tones, without frequency conversion or down-mixing, for picometer (pm)-scale motion detection at room temperature. The 1L- and 2L-MoS2 VCTs exhibit excellent n-type transistor behavior with high mobility [150 cm2/(V·s)] and small subthreshold swing (98 mV/dec). Their resonance motions are probed by directly measuring the small-signal drain-source currents (iD). Electromechanical characteristics of the devices are extracted from the measured iD, yielding resonances at f0 = 31.83 MHz with quality factor Q = 117 and f0 = 21.43 MHz with Q = 110 for 1L- and 2L-MoS2 VCTs, respectively. The 2L-MoS2 VCT demonstrates excellent current and displacement sensitivity (Si1/2 = 2 pA/Hz1/2 and Sx1/2 = 0.5 pm/Hz1/2). We demonstrate f0 tuning by controlling gate voltage VG and achieve frequency tunability Δf0/f0 ≈ 8% and resonance frequency change Δf0/ΔVG ≈ 0.53 kHz/mV. This study helps pave the way to realizing ultrasensitive self-transducing 2D nanoelectromechanical systems at room temperature, in all-electronic configurations, for on-chip applications. 

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3. Memristive devices with short-term and long-term memory behaviors for processing temporal information

   https://doi.org/10.1063/5.0175200  

   Ki, Seung Jun; Kim, Jisoo; Chen, Mingze; Liang, Xiaogan (November 2023, Applied Physics Letters)

   Memristors based on 2D semiconductors such as MoS2 and its derivative materials exhibit analog switching behaviors capable of emulating some synaptic functions, including short-term plasticity, long-term potentiation, and spike-time-dependent-plasticity. Additional investigation is needed to realize reliable control of such synaptic behaviors for practical device implementation. To meet this scientific need, we fabricated MoS2-based memristors and studied their paired-pulse facilitation (PPF) and long-term memory characteristics under different pulse programming settings. This research has provided a guideline for identifying the programming settings for different neuromorphic processes. For example, a specific setting resulting in PPF > 30% and long-term conductance change < 20% has been identified to be suited for processing real-time temporal information. Furthermore, this research also indicates that the MoS2 memristor keeps having an almost constant relative change in conductance but greatly enhanced drive current level under laser illumination. This behavior can enable an easy integration of such memristive devices with state-of-the-art controller circuits for practice neuromorphic control applications. 

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4. Nanoscale Reconfigurable Si Transistors: From Wires to Sheets and Unto Multi‐Wire Channels

   https://doi.org/10.1002/aelm.202300483  

   Wind, Lukas; Behrle, Raphael; den_Hertog, Martien_I; Murphey, Corban_G_E; Cahoon, James_F; Sistani, Masiar; Weber, Walter_M (December 2023, Advanced Electronic Materials)

   Abstract In this work, bottom‐up Al–Si–Al nanowire (NW) heterostructures are presented, which act as a prototype vehicle toward top‐down fabricated nanosheet (NS) and multi‐wire (MW) reconfigurable field‐effect transistors (RFETs). Evaluating the key parameters of these transistors regarding the on‐ and off‐currents as well as threshold voltages for n‐ and p‐type operation exhibit a high degree of symmetry. Most notably also a low device‐to‐device variability is achieved. In this respect, the investigated Al–Si material system reveals its relevance for reconfigurable logic cells obtained from Si NSs. To show the versatility of the proposed devices, this work reports on a combinational wired‐AND gate obtained from a multi‐gate RFET. Additionally, up‐scaling the current is achieved by realizing a MW RFET without compromising reconfigurability. The Al–Si–Al platform has substantial potential to enable complex adaptive and self‐learning combinational and sequential circuits with energy efficient and small footprint computing paradigms as well as for native components for hardware security circuits. 

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5. A perspective on the doping of transition metal dichalcogenides for ultra-scaled transistors: Challenges and opportunities

   https://doi.org/10.1063/5.0133064  

   Younas, Rehan; Zhou, Guanyu; Hinkle, Christopher L. (April 2023, Applied Physics Letters)

   To support the ever-growing demand for faster, energy-efficient computation, more aggressive scaling of the transistor is required. Two-dimensional (2D) transition metal dichalcogenides (TMDs), with their ultra-thin body, excellent electrostatic gate control, and absence of surface dangling bonds, allow for extreme scaling of the channel region without compromising the mobility. New device geometries, such as stacked nanosheets with multiple parallel channels for carrier flow, can facilitate higher drive currents to enable ultra-fast switches, and TMDs are an ideal candidate for that type of next generation front-end-of-line field effect transistor (FET). TMDs are also promising for monolithic 3D (M3D) integrated back-end-of-line FETs due to their ability to be grown at low temperature and with less regard to lattice matching through van der Waals (vdW) epitaxy. To achieve TMD FETs with superior performance, two important challenges must be addressed: (1) complementary n- and p-type FETs with small and reliable threshold voltages are required for the reduction of dynamic and static power consumption per logic operation, and (2) contact resistance must be reduced significantly. We present here the underlying strengths and weaknesses of the wide variety of methods under investigation to provide scalable, stable, and controllable doping. It is our Perspective that of all the available doping methods, substitutional doping offers the ultimate solution for TMD-based transistors. 

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