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This content will become publicly available on May 28, 2025

Title: Low-voltage short-channel MoS2 memtransistors with high gate-tunability
Neuromorphic hardware promises to revolutionize information technology with brain-inspired parallel processing, in-memory computing, and energy-efficient implementation of artificial intelligence and machine learning. In particular, two-dimensional (2D) memtransistors enable gate-tunable non-volatile memory, bio-realistic synaptic phenomena, and atomically thin scaling. However, previously reported 2D memtransistors have not achieved low operating voltages without compromising gate-tunability. Here, we overcome this limitation by demonstrating MoS2 memtransistors with short channel lengths < 400 nm, low operating voltages < 1 V, and high field-effect switching ratios > 10,000 while concurrently achieving strong memristive responses. This functionality is realized by fabricating back-gated memtransistors using highly polycrystalline monolayer MoS2 channels on high-κ Al2O3 dielectric layers. Finite-element simulations confirm enhanced electrostatic modulation near the channel contacts, which reduces operating voltages without compromising memristive or field-effect switching. Overall, this work demonstrates a pathway for reducing the size and power consumption of 2D memtransistors as is required for ultrahigh-density integration.  more » « less
Award ID(s):
2106964 2317974
NSF-PAR ID:
10538087
Author(s) / Creator(s):
; ; ; ;
Publisher / Repository:
Springer Nature
Date Published:
Journal Name:
Journal of Materials Research
Volume:
39
Issue:
10
ISSN:
0884-2914
Page Range / eLocation ID:
1463-1472
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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