Tensile-strained pseudomorphic Ge 1–x–y Sn x C y was grown on GaAs substrates by molecular beam epitaxy using carbon tetrabromide (CBr 4 ) at low temperatures (171–258 °C). High resolution x-ray diffraction reveals good crystallinity in all samples. Atomic force microscopy showed atomically smooth surfaces with a maximum roughness of 1.9 nm. The presence of the 530.5 cm −1 local vibrational mode of carbon in the Raman spectrum verifies substitutional C incorporation in Ge 1–x–y Sn x C y samples. X-ray photoelectron spectroscopy confirms carbon bonding with Sn and Ge without evidence of sp 2 or sp 3 carbon formation. The commonly observed Raman features corresponding to alternative carbon phases were not detected. Furthermore, no Sn droplets were visible in scanning electron microscopy, illustrating the synergy in C and Sn incorporation and the potential of Ge 1–x–y Sn x C y active regions for silicon-based lasers.
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This content will become publicly available on November 21, 2024
Influence of H on Sn incorporation in GeSnC alloys grown using molecular beam epitaxy
GeSnC alloys offer a route to direct bandgap semiconductors for CMOS-compatible lasers, but the use of CBr4 as a carbon source was shown to reduce Sn incorporation by 83%–92%. We report on the role of thermally cracked H in increasing Sn incorporation by 6x–9.5x, restoring up to 71% of the lost Sn, and attribute this increase to removal of Br from the growth surface as HBr prior to formation of volatile groups such as SnBr4. Furthermore, as the H flux is increased, Rutherford backscattering spectroscopy reveals a monotonic increase in both Sn and carbon incorporation. X-ray diffraction reveals tensile-strained films that are pseudomorphic with the substrate. Raman spectroscopy suggests substitutional C incorporation; both x-ray photoelectron spectroscopy and Raman suggest a lack of graphitic carbon or its other phases. For the lowest growth temperatures, scanning transmission electron microscopy reveals nanovoids that may account for the low Sn substitutional fraction in those layers. Conversely, the sample grown at high temperatures displayed abrupt interfaces, notably devoid of any voids, tin, or carbon-rich clusters. Finally, the surface roughness decreases with increasing growth temperature. These results show that atomic hydrogen provides a highly promising route to increase both Sn and C to achieve a strongly direct bandgap for optical gain and active silicon photonics.
more » « less- NSF-PAR ID:
- 10509569
- Publisher / Repository:
- J. Appl. Phys.
- Date Published:
- Journal Name:
- Journal of Applied Physics
- Volume:
- 134
- Issue:
- 19
- ISSN:
- 0021-8979
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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